Information on the most widely used ASTM standards within the materials testing industry
The mechanical property testing of the semiconductor industry revolves around the entire industry chain of wafer substrates, packaging materials, interconnect structures, and devices/modules, and its core features are micro-scale, high precision, multi-material collaborative adaptation, and dual verification of process/reliability. The test objects cover more than ten types of materials such as silicon/silicon carbide/gallium nitride, metal interconnect materials, polymer packaging materials, ceramic substrates, etc., and are used for material screening, process yield control, and device reliability verification.

1. Mechanical property testing of wafer/substrate materials:
The test objects are silicon wafers (mono/polycrystalline), wide bandgap semiconductor substrates (SiC, GaN, GaAs), and sapphire substrates, most of which are brittle crystals, and the core detects fracture resistance, deformation resistance, hardness and other properties to avoid chipping and warping during wafer cutting/grinding/bonding.
| Testing items | Purpose of the test | Specimen information | Test equipment | Test Principle / Method | Core application scenarios |
| Nanohardness / Yung's modulus | Check the surface hardness and elastic modulus of the substrate to avoid surface scratches and plastic deformation during grinding/polishing | Original substrate/polished substrate, no specimen preparation, directly test the surface | Nanoindenter (Berkovich indenter) | The microload (μN-mN grade) indenter is pressed into the surface of the material, the depth-load curve is recorded, and the hardness/modulus is calculated by the Oliver-Pharr method | Substrate polishing process yield control, wide bandgap substrate (SiC) surface performance verification before epitaxy, and sapphire substrate hardness testing before dicing |
| Warpage / bending deformation | Detects overall wafer flatness to avoid alignment deviation during bonding/lithography | Whole wafer (4/6/8/12 inch), post-cut wafer | Laser warpage tester, 3D topography instrument, white light interferometer | The laser scans the wafer surface, collects height data, and calculates the overall warp (Warp) and local flatness (Bow) | Deformation detection after wafer grinding/thinning, interface deformation verification after wafer bonding (silicon-silicon bonding, heterogeneous bonding), and wafer flatness screening before lithography |
| Fracture toughness (indentation method / unilateral notched beam) | Verify the crack propagation resistance of brittle substrates to avoid wafer chipping caused by microcracks | Substrate specimens with prefabricated micro-notches (e.g., SiC: 20×10×1mm) | nanoindentation instrument, microload universal testing machine | Indentation method: the indenter is pressed to produce microcracks, and the fracture toughness is calculated by the crack length; Unilateral notched beam: Three-point bending loading notched specimens to record fracture loads | Wide bandgap substrate (SiC, GaN) preparation process, wafer laser cutting post-crack control |
2. Mechanical property testing of packaging core materials
Semiconductor packaging is a multi-material composite system (metal, polymer, ceramic, glass), the core of which tests the strength, modulus, thermomechanical adaptability, and aging resistance of the material, and avoids thermal stress cracking caused by the mismatch of material mechanical properties (such as delamination caused by the difference in thermal expansion coefficient between the chip and the plastic encapsulant).
(1) Metal packaging materials (lead frame, bonding wire, solder, heat sinks)
| Testing items | Purpose of the test | Specimen information | Test equipment | Core application scenarios |
| Microtensile strength/elongation | Verify the tensile fracture resistance of fine metal materials to avoid fracture during bonding/stamping | Bonding wire (Au/Al/Cu, diameter 18-50μm), lead frame punch sectioning (0.1-0.3mm thick) | Micro-load universal testing machine (with micro-tensile fixture), electronic stretching machine | Bonding wire selection (e.g., mechanical verification of Cu wire instead of Au wire), lead frame stamping process, solder foil performance testing |
| Hardness (Vickers / Knoop) | Check the hardness of the metal surface to avoid the stamping of the lead frame and the softening and deformation of the solder | Lead frame surface, solder bumps, heat sink surface | Microscopic Vickers hardness tester, Knoop hardness tester | Verification of lead frame plating process (Ni/Au plating), hardness testing of solder alloy (SnAgCu, SnPb), and surface treatment verification of heat sinks |
| Creep performance | Verify the slow deformation ability of solder under temperature + load to avoid solder failure after long-term operation | Solder specimen (φ1×2mm), solder bump array | High Temperature Creep Tester (Micro Load) | Power device solder interconnects (such as IGBT solder layers), solder selection for automotive semiconductor packaging, and reliability verification of high-temperature semiconductor devices |
| Fatigue performance (tensile compression fatigue) | Verify the failure resistance of metal materials under cyclic loads and match the dynamic working load of semiconductors | Lead frame specimens, solder specimens | Electro-hydraulic servo fatigue tester (microload class) | Reliability verification of automotive semiconductor (engine compartment) lead frame and automotive-grade chip solder layer |
(2) Polymer packaging materials (plastic EMC, underfill adhesive UF, adhesive DA)
| Testing items | Purpose of the test | Specimen information | Test equipment | Core application scenarios |
| Flexural strength | Verify the rigidity and bending resistance of the encapsulant to avoid cracking during transportation/assembly of the package | Standard splines (ISO 178:80×10×4mm), injection molded | Electronic universal testing machine (100N-10kN) | Selection of plastic encapsulation materials, verification of packaging molding process (injection pressure/temperature), and attenuation detection of plastic encapsulation materials after high temperature aging |
| Tensile strength / elongation at break | Verify the toughness and tensile resistance of polymer adhesives/encapsulants to avoid cracking caused by thermal stress | Standard splines (ISO 527:150×10×4mm), injection molding/curing molding | Electronic universal testing machine | Selection of underfill adhesive and viscotic adhesive, and verification of temperature and aging resistance of plastic encapsulants |
| Shore / Rockwell hardness | The hardness of polymer materials is tested to avoid deformation of the packaging caused by too soft plastic material and brittle cracking caused by too hardness | Standard Spline (Thickness ≥ 6mm) | Shore hardness tester (Type D), Rockwell hardness tester | Conventional performance testing of plastic encapsulation materials and verification of the curing degree of underfill adhesive |
| Shear strength (adhesive layer shear) | Verify the bond strength of the adhesive/underfill adhesive to avoid delamination of the chip from the substrate/pad | Chip-substrate bonding specimens (e.g. silicon wafers - PCBs / ceramic substrates) | Micro Shear Tester and Electronic Universal Tester | Selection of adhesive/underfill adhesive, yield control of packaging and placement process, and verification of bonding performance after thermal aging of devices |

(3) Ceramic/glass substrates (alumina, aluminum nitride, glass ceramics)
| Testing items | Purpose of the test | Specimen information | Test equipment | Core application scenarios |
| Flexural strength (three-point bending) | Verify the resistance of the substrate to resist fracture and avoid chipping during the patch/soldering process | Substrate Slice (20×10×0.63mm) | Electronic universal testing machine (microload class) | Power semiconductor ceramic substrate selection, substrate soldering process verification, and high-temperature substrate performance testing |
| Fracture toughness | Verify the crack propagation ability of the substrate to avoid micro-crack failure caused by machining | Substrate specimens with prefabricated notches | Microload universal testing machine, nanoindentator | Preparation of aluminum nitride (AlN) high thermal conductivity substrate, glass ceramic substrate dicing process |
3. Testing of key mechanical connection properties in the packaging process:
The core of semiconductor packaging is the mechanical reliability of interconnect structures (such as bonding, soldering, bonding), which belongs to component-level process verification, which directly determines packaging yield and device life, and is one of the core mechanical testing links in the semiconductor industry.
| Testing items | Purpose of the test | Specimen information | Test equipment | |
| Bond strength (pull-off / shear) | Verify the bonding reliability of gold wire, aluminum wire, copper wire with chip pads and lead frames to avoid bond point detachment/breakage | Package specimens with bonding wires (e.g., chip-lead frame bonds), wafer-level bonding specimens | Wire Bond Tester, Micro Shear Tester | |
| Solder bump / solder ball shear strength | Verify the connection strength of the solder bump (Flip Chip) and BGA/CSP solder ball to the chip/substrate to prevent the solder ball from falling off | Flip Chip specimens, BGA/CSP packages, wafer-level bump specimens | Micro shear tester BGA shear tester | |
| Shear strength (chip shear) | Verify the adhesive adhesive strength of the chip and the substrate/lead frame to avoid chip delamination | Package specimens after bonding (chip - substrate / lead frame) | Chip shear tester, micro universal testing machine | |
| The interlayer shear strength of the stacked encapsulation | Verify the strength of the interlayer connection of 3D IC / stacked packages to avoid delamination between layers | IC stacked specimens, POP packaging specimens | Micro Shear Tester | |
| Wafer bond interface strength (peel/shear) | Verify the interfacial bond strength of silicon-silicon bonds, heterogeneous bonds (e.g., silicon-glass, SiC-silicon) to avoid interface delamination | Wafer bonding specimen | Electronic universal testing machine |
Related products and device
Related Standard
ASTM C158 is a standard test method for determining the flexural strength (modulus of rupture, MOR) of glass and glass-ceramics via bending, covering two core methods (A for flat glass, B for rectangular/elliptical cross-sections) with clear specimen, equipment, procedure, and calculation rules. It is critical for glass engineering as flexural strength directly governs structural safety, design optimization, and compliance with industry standardsNational Glass Association.
ASTM D1822 Tensile Impact Energy to Break Plastics and Electrical Insulating Materials
ASTM D1822 standard outlines test procedures to find the energy required to rupture tension-impact specimens of plastic or electrical insulating materials. Test materials that are too bendable or too thin to be tested in accordance with the ASTM D256 standard are ideal for this test along with more rigid materials.
ASTM D882: Standard Test Method for Tensile Properties of Thin Plastic Sheeting
ASTM D882 test methods is used to measure tensile properties including ultimate tensile strength, yield strength, elongation, tensile energy to break and tensile modulus of elasticity of thin plastic sheeting and films. The samples are cut in strips that minimally have to be eight times longer than wide. No dumbbell shape is cut for materials of that thickness. Cut samples need to be free of nicks and other cutting defects since they will have an important impact on the test results variation. The samples are tested in specific conditions of pre-treatment, sample orientation, temperature, humidity, and rate of pulling. ASTM D882 can be used for testing materials thinner than 1mm in thickness.
ASTM D4329 covers specific procedures and test conditions based on practices ASTM G151 as well as ASTM G154. ASTM D4329 also covers the preparation of test specimens, the test conditions best suited for plastics, and the evaluation of test results.
ASTM D4329 useage:
Polymers can have their mechanical, electrical and optical properties significantly altered when exposed under outdoor conditions such as light, heat and water. This method is intended to prompt property changes associated with end-use conditions, including the effects of daylight, moisture in addition to heat. The simulation of the deterioration provoked by localized weather, such as, atmospheric pollution, biological attack, and saltwater exposure is not intended by the exposure used in this practice. For a combination of fluorescent light exposure and salt water, you should consider ASTM D5894.
ASTM D953 is a relatively bearing strength standard, this standard actually contains both tensile-mode and compressive-mode loading fixtures, although the latter fixture is seldom used. The standard tensile loading fixture is shown in Figure below.
The purpose of the test is to determine the bearing strength of the material and to show the bearing stress versus the deformation of the hole. The allowable deformation of the hole in the material should be such as to produce no looseness of joints.
ASTM D746: Standard Test Method for Brittleness Temperature of Plastics and Elastomers by Impact
ASTM D746 test method establishes the temperature at which 50 % of the specimens tested would probably fail when subjected to the conditions specified herein. The test provides for the evaluation of long-time effects such as crystallization, or those effects that are introduced by low-temperature incompatibility of plasticizers in the material under test. Plastics and elastomers are used in many applications requiring low-temperature flexing with or without impact. Use data obtained by this method to predict the behavior of plastic and elastomeric materials at low temperatures only in applications in which the conditions of deformation are similar to those specified in this test method. This test method has been found useful for specification purposes, but does not necessarily measure the lowest temperature at which the material is suitable for use.
Core standards for mechanical testing in the semiconductor industry
Semiconductor mechanical testing needs to follow industry-specific standards, the core is divided into international general standards and subdivision field standards, and some of the basic standards for testing and multiplexing material mechanics, the core standards are as follows:
1. JEDEC standards: general reliability standards for semiconductor devices (e.g., JESD22-A104 (temperature cycling), JESD22-A107 (mechanical shock), JESD22-B117 (vibration));
2. AEC-Q100/101 standard: automotive-grade semiconductor device reliability standard (including mechanical and thermomechanical reliability testing);
3. IPC standards: Semiconductor packaging process inspection standards (e.g., IPC-9701 (solder performance), IPC-SM-785 (wire bond strength));
4. ISO/IEC standards: basic standards for material mechanics (e.g. ISO 178 (bending), ISO 527 (tensile), ISO 14577 (nanoindentation));
5. ASTM Standards: Microscale mechanical testing standards (e.g., ASTM E2546 (nanoindentation), ASTM E1820 (fracture toughness));
6. GB/T standards: domestic semiconductor testing standards (such as GB/T 40230 (mechanical reliability of semiconductor devices), GB/T 30644).

Key points of core testing equipment selection:
The core differences between mechanical testing equipment in the semiconductor industry and traditional material mechanical equipment are micro-load, high precision, micron-level positioning, and non-destructive testing.
1. Load range: mainly micro-load stage (μN-mN stage for nanoindentation/MEMS, N stage for wafer/packaging materials, kN stage for module-level vibration/shock);
2. Positioning accuracy: micron / sub-micron (especially bonding/solder shearing, MEMS microstructure detection);
3. Environmental adaptation: support high and low temperature/vacuum (such as high temperature bending, thermal creep, vacuum bond strength testing);
4. Automation: Support batch testing (such as wafer-level bump shearing, bond strength batch testing), adapted to semiconductor mass production processes;
5. Non-destructive: Prefer non-destructive testing equipment such as 3D topography and ultrasonic scanning (C-SAM) to avoid detecting damaged devices.
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